High temperature film forming polyamide polymers

ABSTRACT

High temperature-resistant polyamides are derived from alkyl substituted aminophenylindanamines and dicarboxylic acids or their derivatives. Films formed from the polyamides are useful in photographic elements, particularly as supports in photographic elements.

United States Patent 11 1 1111 3,915,939

Wilson Oct. 28, 1975 HIGH TEMPERATURE FILM FORMING 3,803,090 4/1974 Wilson 96/87 R POLYAMIDE POLYMERS 3,859,364 1/1975 Wilson 96/87 R 3,873,320 3/1975 Wilson 96/87 R [75] Inventor: John Charles Wilson, Rochester,

Primary Examiner-Roland E. Martin, Jr. Assistant E.\-aminer.l. P. Brammer Attorney, Agent, or Firm-A. H. Rosenstein [73] Assignee: Eastman Kodak Company,

Rochester, N.Y.

22 Fiied: Jan. 27, 1975 21 Appl. No.: 544,170

Related US. Application Data [57] ABSTRACT [62] Division of Ser. No. 444,611, Feb. 21, 1974.

High temperature-resistant polyamides are derived Cl 260/78 96/87 R; 260/ 7 CZ from aikyl substituted aminophenylindanamines and [51] Int. C1,? ..G08G 69/44; (303C l/78; dicarboxylic acids or their derivatives. Films formed G086 73/ 6 from the polyamides are useful in photographic ele- [58] Field of Search 96/87 R, 48 HD, 114.1; ments, particularly as supports in photographic ele- 260/78 R ments.

[56] 9 References Cited 18 Claims, No Drawings UNITED STATES PATENTS 3,725,070 4/1973 Hamb et a1. 96/87 R HIGH TEMPERATURE FILM FORMING POLYAMIDE POLYMERS This is a division of application Ser. No. 444,611, filed Feb. 21, 1974.

This invention relates to novel film-forming polyarnides. In one aspect this invention relates to film-forming polyamides derived from 1,1,3-trialkyl-3-(p-aminophenyl)-5-indanamine and dicarboxylic acid and dicarboxylic acid derivatives. In another aspect this invention relates to photographic elements containing the polyamides, preferably as a film support.

There is a continuing demand for low cost filmforming materials with improved physical properties which can be used as supports for photographic elements. Many of the currently available film-forming compositions that exhibit good physical characteristics are commercially unattractive owing to the cost of the component ingredients or the difi'iculty of the manufacturing conditions.

US. Pat. No. 3,725,070, issued Apr. 3, 1973, relates to high temperature-resistant polymers of 1,1- spirobi[indan]diols or diamines which may be used in photographic applications and US. Pat. No. 3,634,089, issued Jan. 1 l, 1972 relates to polymers of 1,1,3- trimethyl-5-carboxy-3-(p-carboxyphenyl)indan esters having high glass transition temperatures which are useful in photographic elements.

Means for the preparation of 1,1,3-trimethyl-3-(paminophenyl)-5-indanamine are described in Petropoulous, John C. and Fisher, James 1., J. Am. Chem. Soc., Volume 80, 1938-41 (1958) and US. Pat. No. 2,855,420, issued Oct. 7, 1958 to Petropoulous.

Polyamides derived from conventional diarnines and a commercially available material referred to as phenylindandicarboxylic acid are described in US. Pat. No. 3,376,270, issued Apr. 2, 1968 to Ridgeway.

It is an object of this invention to provide novel polymeric amides having high glass transition temperatures suitable for high temperature applications which are economically prepared.

It is another object of this invention to provide films which are resistant to high temperatures and which can be solvent-cast.

It is a further object of this invention to provide photographic film supports comprising the novel polyamides of this invention. 1

These and other objects of this invention are obtained from film-forming polyamides derived from lalkyl substituted aminophenylindanarnines and dicarboxylic acid'or acid derivatives.

The present invention comprises a film-forming polyamide comprising amine repeating units (A) and dicarboxylic acid repeating units (B) having the formulas:

wherein:

R and R are independently selected from the group consisting of hydrogen and alkyl, preferably containing from 1 to 6 carbon atoms such as methyl, ethyl, propyl, butyl, pentyl and hexyl and isomers thereof. In a preferred embodiment R and R are methyl;

R is alkyl of from 1 to 6 carbon atoms such as those described above for R and R In a preferred embodiment R is methyl;

R", R R and R are independently selected and can be hydrogen atoms, aryl radicals such as phenyl, naphthyl, anthryl, phenanthryl and the like, including substituted aryl radicals, halogen atoms, nitro radicals, tertiary amino radicals, cyano radicals, alkoxy radicals and the like, wherein the substituents on the substituted aryls are limited to the above radicals. In a preferred embodiment R, R', R and R" are hydrogen.

R R and R are independently selected from the group consisting of aliphatic, cycloaliphatic and aromatic moieties. More specifically, R, R, and R can be radicals selected from the group consisting of alkylene radicals of from 2 to 10 carbon atoms, such as ethylene, tetrarnethylene, pentarnethylene, octamethylene, nonarnethylene and the like; arylene radicals, such as 0-, m-, or p-phenylene, naphthylene or anthrylene, unsubstituted or substituted with radicals such as halogen, nitro, cyano, alkyl of l to 6 carbon atoms or alkoxy of 1 to 6 carbon atoms; arylenebisalkylene radicals wherein the alkylene portion has 1 to 6 carbon atoms, such as phenylenedimethylene, phenylenediethylene, naphthylene, dimethylene, naphthylenediethylene and the like; cycloalkylene radicals, such as cyclopentylene, cyclohexylene, norbornylene; alkylenebi sarylene radicals where the alkylene portion contains 1 to 12 carbon atoms, such as ethylene,"trirnethylene, hexamethylene, decamethylene, dodecamethylene, and the arylene portion is as defined above; alkylidenebisarylene radicals where the alkylidene por-" tion contains 1 to 12 carbon atoms, such as ethylidene,

allylidene, hexylidene and the like, and the arylene portion is defined above; and arylenealkylene radicals where the arylene and alkylene portions are as defined above.

The radicals R, R and R can also be units having the formula:

wherein each R and R, which can be the same or different, are selected from the group consisting of hydrogen atoms, aryl radicals, such as phenyl, including substituted phenyl, halogen atoms, nitroradicals, tertiary amino radicals, cyano radicals, alkoxy radicals and the like, and wherein the substitutents on the phenyl radical can be a halogen atom, nitro radical, tert-amino radical, cyano radical, or alkoxy radical. R and R represent aliphatic monocyclic or bicyclic radicals or can each be hydrogen atoms, alkyl radicals or from 1 to 6 carbon atoms, including substituted alkyl radicals,

such as fluoromethyl, difluoromethyl, trifluoromethyl, dichlorofluoromethyl, 2-[2,3,4,5-tetrahydro-2,2- dimethyl-4-oxofur-3-yl]ethyl and the like; cycloalkyl radicals of from 4 to 6 carbon atoms, such as cyclohexyl; and aromatic radicals havingfrom 6 to 20 carbon atoms, such as phenyl, 3,4-dichlorophenyl, 2,4- dichlorophenyl. R 'and R taken together with the carbon atom to which they are attached can represent a monocyclic, polycyclic, or heterocyclic moiety having from 4 to 15 atoms in the ring system. In a preferred embodiment R is arylene and R is alkylene;

R and R are independently selected from the group consisting of hydrogen, alkyl, preferably containing from 1 to 6 carbon atoms, such as methyl, ethyl, isopropyl, butyl and hexyl including substituted alkyl, such as 2-chloroethyl, Z-methoxyethyl, 3-bromopropyl and the like; and aryl such as phenyl, including substituted phenyl such as methoxyphenyl, bromophenyl, nitrophenyl and the like.

The polymer comprises at least two repeating units A 2,6-naphthelenedicarboxylic acid, 1 ,4- naphthelenedicarboxylic acid, 1,5-

naphthalenedicarboxylic acid, 1,7-

and B. Repeating units A are derived from diamines and repeating units B are derived from dicarboxylic acids or their derivatives. In repeating units A, W is from 1 to 100 mole percent and X is 100-W mole percent and in repeating units B Y is from l-l00 mole percent and Z is 100-Y mole percent.

The polyamides, generally, may have a broad range of viscosities. In a preferred embodiment, the polyam- Film-forming as used herein refers to a material I which provides a self-supporting film of the material when cast or extruded, for example, when cast in sheets of from l-7 mils thickness.

The film-forming polyamides of this invention are prepared by merely mixing an alkyl substituted aminophenylindanamine in a solvent such as tetrahydrofuran,dioxane, or the like with a solution of a dicarboxylic acid halide in a solvent such as tetrahydrofuran, dioxane, or the like. Acid acceptors such as Na CO K CO NaOH, and the like are also employed. The general method of preparing polyamides such as disclosed in'U.S. PatiNo. 3,006,899 issued Oct. 31, 1961 may be used to prepare the polyamides herein.

The alkyl substituted aminophenylindanamines are prepared as described in US. Pat. No. 2,855,420. The preparation of the preferred 1,1,3-trimethyl-3-(paminophenyD-S-indanamine is described at colunm 4, line 60 to column 5, line-5 of U.S. Pat. No. 2,855,420.

Dicarboxylic acids which can be employed in preparirig the polyamides include succinic acid, glutaric acid, 2-methyladipic acid, diglycolic acid, thiodiglycolic acid, fumaric acid, cyclohexane-l,3-dicarboxylic acid, cyclohexane-l,4-dicarboxylic acid, cyclopentane-l,3- dicarboxylic acid, 2,5-norbornanedicarboxylic acid,

I (the four immediately preceding acids being useful either as the cis or trans form), phthalic acid, isophthalic acid, terephthalic acid, t-butylisophthalic acid, phenylenediacetic acid, phenylenedipropionic acid,

naphthalenedicarboxylic acid, 4,4'-diphenic acid, 4,4 sulfonyldibenzoic acid, 4,4'-oxydibenzoic acid, binaphthyldicarboxylic acid, 4,4'-stilbenedicarboxylic acid, and 9,10-triptycenedicarboxylic acid.

Although the dicarboxylic acids useful in the practice of this invention are employed to advantage in the acid halide form, e.g., the chloride or bromide, the lower monohydric alcohol or phenyl esters of these acids may .also be used. Further, the free dicarboxylic acids are also useful.

7 The film-forming polyamides of this invention can be formed by mixing one or more dicarboxylic acid derivatives with the aminophenylindanamine or with the aminophenylindanamine in combination with another diamine having the formula:

RI R.

wherein:

R, R and R are as described above. Examples of these diamines are ethylenediamine, 1,2- propanediamine, V 1,3-propanediamine, 1,4- butanediamine, l ,6-hexanediamine, l ,4- cyclohexylenediamine, l ,4-cyclohexylbis(methylamine), l,8-menthanediamine, N,N-dimethyl-1,4-

butanediamine, N,N'-diethyl-1,4-hexanediamine, 0-, m-, or p-phenylenediarnine or tolylenediamine, and the hke.

Thus the polyamide may be formed from the aminophenylindanamine and one dicarboxylic acid halide such as in equation 1.

COCl cu ii N 3 2 1- 2Na CO -Nll -ri I 2 Ifrnore than one dicarboxylic acid halide is employed the reaction may be characterized as in equation 2.

If more than one diamine is employed the reaction may be characterized as in equation 3 H 'N CH3 ll Q c c CH3 cu Men N It is understood that the total moles of diamine must example, the glass transition temperature,

0 O H II II 1-C C ZNaCl ZNaHCO monomeric components can be determined by test procedures well known to those skilled in the art.

COCl

O. 5 ZNallCO ZNaCl The film-forming materials of this invention can be generally extruded or cast into flexible supports and COCl + ZNaCl 2NallCO 2 2m co I Nl-l 0.5 u mcug nn 2 3 t I C COCl used in various layer arrangements and structural combinations. Generally, the flexible supports prepared 65 from the polymers of this invention are treated by any convenient method to improve the adhesion of superimposed coatings of layers. Useful procedures include subbing with conventional subbing agents for polymer yield strength, break strength, Youngs modulus and the like. Polymers with properties in a particular range can be obtained by judicious selection of appropriate diamine and dicarboxylic acid components and suitable mixtures thereof. The proper choice and proportions of the supports, contacting with a chemical agent, electron bombardment, and the like. The film-forming polymers of this invention are used to advantage as flexible supports, overcoats or binders for photographic silver hal- EXAMPLE 1 A solution of 2.66 g of 1,1,3-trimethyl-3-(p-aminophenyl)-5-indanamine in 56 ml of tetrahydrofuran and a solution of 2.12 g of sodium carbonate in 67 ml of distilled water were poured in a Waring blender, and

stirred. To this stirred mixture was added a solution of 2.03 g of terephthaloyl chloride in 17 ml of tetrahydrofuran. This mixture was stirred for 10 minutes and poured into methanol. The polymer was isolated,

washed with methanol and dried in vacuum at 80C for 20 5 hours. The resulting polyamide had an inherent viscosity of 0.89.

EXAMPLES 2-4 Solutions of 1,1,3-trimethyl-3-(p-aminophenyl)-5- indanamine were reacted as in Example 1 with dicarboxylic acid chlorides having the formula the properties of the resulting polyamides are shown in Table I.

The inherent viscosity of the resulting polyamide was 0.83 and the glass transition temperature was 345C.

. EXAMPLE 6 A polyamide was prepared using the process of Example 1 with the following reactants and solvents:

l,1,3-trirnethyl-3-(p-aminophenyl)-5-indanarnine 1.33 g 1,6-hexanediamine 0.58 g tetrahydrpfuran 56 ml sodium carbonate 7 2.12 g distilled water 67 ml terephthaloyl chloride 2.03 3 tetrahydrofuran 17 ml The resulting polyamide has an inherent viscosity of 0.82 and a glass transition temperature of 272C.

EXAMPLE 7 A solution comprising 2 g of the polyamide of Example 1 dissolved in 10 ml of N,N-dimethylformamide was coated onto a chrome plated surface at 20C at a thickness of 25 mils with a coating knife. The resultant film was then cured for minutes at 20C and then at 70C for 1 hour and 15 minutes. The film was then cooled, removed from the coating block and cured in a C air oven between 2 frames for 16 hours. A tough, clear and essentially colorless self-supporting film was formed which had the properties listed in Table 2. The film was also heated on a curved surface and observed with respect to distortion at various temperatures. No distortion was noted in the observed range of C to 300C.

TABLE 1 lnherent Glass Transition Example R Viscosity Temp. (Tg) (C) A polyamide was prepared by the process of Example 1 with the following reactants and solvents:

1,1,3-trimethyl-3-(p-aminophenyl)-5-indanamine 2.66 g tetrahydrofuran I 56 ml sodium carbonate 2.12 g 65 distilled water 67 ml terephthaloyl chloride 1.015 g isophthaloyl chloride 1.015 g tetrahydrofuran 17 m1 Table 2 Tensile Properties of Film (2" gauge length, 1'' wide, 1" per min.)

Average thickness, mils 4.5

' Young's Modulus, psi 3.6 X 10" Yield Strength, psi 1.01 X 10 Break Strength, psi 1.13 X 10 Break Elongation, 6.5".

EXAMPLE 8 A film strip prepared as in Example 7 was treated by the process described on pages 12 and 13 of US. pa-

R R u E} tent application Ser. No. 196,725, filed Nov. 8, 1971 N and in French Pat. No. 2,022,357. The treated film was 5 then coated with a conventional silver halide emulsion 7 R R l R 2 and dried. The emulsion adhered very well to the film base when tested by the cellophane tape test on a razorscored surface. 10

The invention has been defined in detail with particular reference to preferred embodiments thereof, but it wherein R and R are independently selected from the will be understood that variations and modifications group consisting of hydrogen and alkyl of from 1 to 6 can be effected within the spirit and scope of the invencarbon atoms; 5 tion. R is alkyl of from 1 to 6 carbon atoms;

I claim: R R R and R are independently selected from the l. A film-forming polyamide comprising amine regroup consisting of hydrogen, aryl, halogen, nitro, peating units (A) and dicarboxylic acid repeating units cyano, tertiary amino or alkoxy; and (B) having the formulas R is an aromatic, cycloaliphatic or aliphatic group.

and 9': The film-forming polyamide of claim 8 wherein R,

R and R are methyl. 1

10. The film-forming polyamide of claim 8 wherein R R'', R and R are hydr'ogen. o o o 11. The film-forming polyamide of claim 8 wherein II u ll 12 if R is arylene. T TC R TC 12. A film-forming polyamide comprising repeating Y Z 40 units having the formula comprising:

wherein R and R are independently selected from the group consisting of hydrogen and alkyl of from 1 to 6 carbon atoms;

R is alkyl of from 1 to 6 carbon atoms;

R, R, R and R are independently selected from the group consisting of hydrogen, aryl, halogen, nitro, cyano, tertiary amino or alkoxy; R and R are independently selected from the group consisting of hydrogen, alkyl and aryl',

R, R and R are independently selected from the group consisting of aromatic, cycloaliphatic, and aliphatic groups; and W represents from I- to 100 mole percent of unit A, X represents 100-W mole percent of unit A, Y represents from 1 to 100 mole percent of unit B and Z represents 100-Y mole percent of unit B.

2. The polyamide of claim 1 wherein R, R and R g g gggl i fig ifigg f g repeating are methyl.

3. The polyamide of claim 1 wherein R", R R and R are hydrogen.

4. The polyamide of claim 1 wherein R is arylene. H CH 3 H a 5. The polyamide of claim 4 wherein R is arylene. 1 N -NC- C 6. The polyamide of claim 1 wherein R is alkylene.

7. The polyamide of claim 1 wherein W is 100 mole percent of unit (A).

8. A film-forming polyamide comprising repeating CH c H units having the formula: 3 3

11 14. A film-formingpolyamide comprising repeating units having the formula comprising:

15. A film-forming polyamide comprising repeatin units having the formula comprising:

16 A film-forming polyamide comprising repeating units having the formula comprising:

Unit (A) CH CH and Unit (B) wherein Y is from 1 to 100 mole percent of unit (B) and Z is 100-Y mole percent of unit (B).

17. A film-forming polyamide comprising repeating units having the formulas comprising:

-Continued Unit 0 O wherein is from 1 to 100 mole percent of unit A and X is IOO-W mole percent of unit A.

18. A film formed from the polyamide of claim 1. 

1. A FILM-FORMING POLYAMIDE COMPRISING AMINE REPEATING UNITS (A) AND DICARBOXYLIC ACID REPEATING UNITS (B) HAVING THE FORMULAS
 2. The polyamide of claim 1 wherein R1, R2 and R3 are methyl.
 3. The polyamide of claim 1 wherein R4, R5, R6 and R7 are hydrogen.
 4. The polyamide of claim 1 wherein R11 is arylene.
 5. The polyamide of claim 4 wherein R12 is arylene.
 6. The polyamide of claim 1 wherein R10 is alkylene.
 7. The polyamide of claim 1 wherein W is 100 mole percent of unit (A).
 8. A film-forming polyamide comprising repeating units having the formula:
 9. The film-forming polyamide of claim 8 wherein R1, R2 and R3 are methyl.
 10. The film-forming polyamide of claim 8 wherein R4, R5, R6 and R7 are hydrogen.
 11. The film-forming polyamide of claim 8 wherein R11 is arylene.
 12. A film-forming polyamide comprising repeating units having the formula comprising:
 13. A film-forming polyamide comprising repeating units having the formula comprising:
 14. A film-forming polyamide comprising repeating units having the formula comprising:
 15. A film-forming polyamide comprising repeating units having the formula comprising:
 16. A film-forming polyamide comprising repeating units having the formula comprising:
 17. A film-forming polyamide comprising repeating units having the formulas comprising:
 18. A film formed from the polyamide of claim
 1. 